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1. Effective secondary electron yields for different surface materials in capacitively coupled plasmas
2. Frequency-dependent electron power absorption mode transitions in capacitively coupled argon-oxygen plasmas
3. Electron power absorption in CF4 capacitively coupled RF plasmas operated in the striation mode
4. Experimental and numerical study of the ionization-attachment instability in an O2 capacitively coupled radio frequency plasma
5. On the in-situ determination of the effective secondary electron emission coefficient in low pressure capacitively coupled radio frequency discharges based on the electrical asymmetry effect
6. Self-bias voltage formation and charged particle dynamics in multi-frequency capacitively coupled plasmas
7. Energy efficient F atom generation and control in CF4 capacitively coupled plasmas driven by tailored voltage waveforms
8. Hysteresis in radio frequency capacitively coupled CF4 plasmas
9. The electrical asymmetry effect in electronegative CF4 capacitive RF plasmas operated in the striation mode
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