Institute Of Microelectronics Technology And High Purity Materials 1
1. Sensitivity and Contrast Characterization of PMMA 950K Resist Under 30 keV Focused Ga+ Ion Beam Exposure
2. Comprehensive Investigation of the Commercial ELP-20 Electron-Beam Lithography Resist
3. The photoacoustoelectric effect of the SAW amplification in the structure of Graphene-Piezocrystal LiNbO3
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