Efficiency of magnetostatic protection using nanostructured permalloy shielding coatings depending on their microstructure
Zubar T. Grabchikov S. Kotelnikova A. Kaniukov E. Kutuzau M. Leistner K. Nielsch K. Vershinina T. Tishkevich D. Kanafyev O. Kozlovskiy A. Zdorovets M. Fedosyuk V. Trukhanov A.
March 2021MDPI AG
Nanomaterials
2021#11Issue 31 - 13 pp.
The effect of microstructure on the efficiency of shielding or shunting of the magnetic flux by permalloy shields was investigated in the present work. For this purpose, the FeNi shielding coatings with different grain structures were obtained using stationary and pulsed electrodeposi-tion. The coatings’ composition, crystal structure, surface microstructure, magnetic domain struc-ture, and shielding efficiency were studied. It has been shown that coatings with 0.2–0.6 µm grains have a disordered domain structure. Consequently, a higher value of the shielding efficiency was achieved, but the working range was too limited. The reason for this is probably the hindered movement of the domain boundaries. Samples with nanosized grains have an ordered two-domain magnetic structure with a permissible partial transition to a superparamagnetic state in regions with a grain size of less than 100 nm. The ordered magnetic structure, the small size of the domain, and the coexistence of ferromagnetic and superparamagnetic regions, although they reduce the maxi-mum value of the shielding efficiency, significantly expand the working range in the nanostruc-tured permalloy shielding coatings. As a result, a dependence between the grain and domain structure and the efficiency of magnetostatic shielding was found.
Magneto-static shielding , Microstructure , Nanostructured coating , Permalloy , Pulsed electrodeposition
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Laboratory of Magnetic Films Physics, Scientific-Practical Materials Research Centre of National Academy of Sciences of Belarus, Minsk, 220072, Belarus
Laboratory of Single Crystal Growth, South Ural State University, Chelyabinsk, 454080, Russian Federation
Department of Technology of Electronics Materials, National University of Science and Technology MISiS, Moscow, 119049, Russian Federation
Leibniz IFW Dresden, Helmholtzstrasse 20, Dresden, 01069, Germany
Institute of Material Science, TU Dresden, Dresden, 01062, Germany
Joint Institute for Nuclear Research, Dubna, 141980, Russian Federation
The Institute of Nuclear Physics, Almaty, 050032, Kazakhstan
Engineering Profile Laboratory, L.N. Gumilyov Eurasian National University, Nur-Sultan, 010008, Kazakhstan
Department of Intelligent Information Technologies, The Ural Federal University, Yekaterinburg, 620002, Russian Federation
Laboratory of Magnetic Films Physics
Laboratory of Single Crystal Growth
Department of Technology of Electronics Materials
Leibniz IFW Dresden
Institute of Material Science
Joint Institute for Nuclear Research
The Institute of Nuclear Physics
Engineering Profile Laboratory
Department of Intelligent Information Technologies
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