Thermal Diffusion of Cadmium in Films of the Vanadium–Cadmium System
Volodin V.N. Tuleushev Y.Z. Karakozov B.K. Kalieva A.K. Zhakanbaev E.A.
December 2023Pleiades Publishing
Journal of Surface Investigation
2023#17Issue Suppl 1S371 - S377 pp.
Abstract—: Samples of coatings with a content of 18.98–74.29 wt % Cd are formed via the sputtering of vanadium and cadmium targets in low-pressure plasma and the sequential deposition of ultrafine particles. As a result of X-ray studies, it is found that below the concentration of 56.45 wt %, the films represent the α–V phase; with a higher cadmium content, the phases of solid solution and free cadmium coexist. On the basis of the obtained dependence of the lattice parameter of the α–V phase on the Cd content in the coating, a method for determining mass loss during annealing is proposed. The process of the diffusion of cadmium in the α–V phase and free cadmium in coatings is studied using the method of determining the diffusion coefficients during sublimation in vacuum. The diffusion coefficients of cadmium in solid solutions at 473–573 K vary within the range of (2–300) × 10–15 cm2/s, and diffusion coefficients of free cadmium in coatings vary within the range of ~(2–20) × 10–15 cm2/s. In both cases, the values of the activation energy 0.31–0.80 and 0.28–0.44 kJ/mol, respectively, indicate the vacancy mechanism of the process. On the basis of the weight loss of cadmium during annealing, the average sublimation rate is determined varying at 473–573 K in the range of (0.69–5.60) × 10–7 kg/(m2 s), which is acceptable in the technology for producing porous vanadium.
coating , deposition , diffusion coefficient , lattice parameter , solid solution , sputtering , sublimation
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Institute of Nuclear Physics of the Ministry of Energy of the Republic of Kazakhstan, Almaty, 050032, Kazakhstan
Institute of Nuclear Physics of the Ministry of Energy of the Republic of Kazakhstan
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