Damage kinetics induced by swift heavy ion impacts onto films of different thicknesses
Rymzhanov R.A. Medvedev N. Volkov A.E.
15 November 2021Elsevier B.V.
Applied Surface Science
2021#566
Response of CaF2 thin films to swift heavy ions irradiation is studied with Monte-Carlo code TREKIS and molecular dynamics simulations. Two factors affecting the damage kinetics in ion tracks in films of different thickness are considered: electron emission and an effect of the layer thickness. It is shown that escape of electrons from the target surface is important in films thinner than 15 nm and can significantly reduce energy deposited into the lattice. Three different modes of damage realize depending on the layer thickness: a through hole forms in the thinnest layers despite energy loss via electron emission, semispherical and spherical hillocks form at intermediate thicknesses, emission of nanoclusters occurs from thick layers.
Electron emission , Electronic excitation , Nanocluster emission , Surface damage , Swift heavy ion , Thin film
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Joint Institute for Nuclear Research, Joliot-Curie 6 Dubna, Moscow Region, 141980, Russian Federation
The Institute of Nuclear Physics, Ibragimov St. 1, Almaty, 050032, Kazakhstan
Institute of Physics, Czech Academy of Sciences, Na Slovance 2, Prague 8, 182 21, Czech Republic
Institute of Plasma Physics, Czech Academy of Sciences, Za Slovankou 3, Prague 8, 182 00, Czech Republic
P.N. Lebedev Physical Institute of the Russian Academy of Sciences, Leninskij pr., 53, Moscow, 119991, Russian Federation
Joint Institute for Nuclear Research
The Institute of Nuclear Physics
Institute of Physics
Institute of Plasma Physics
P.N. Lebedev Physical Institute of the Russian Academy of Sciences
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