Atomistic Model of Wet Chemical Etching of Swift Heavy Ion Tracks
Gorbunov S.A. Babaev P.A. Rymzhanov R.A. Volkov A.E. Voronkov R.A.
16 March 2023American Chemical Society
Journal of Physical Chemistry C
2023#127Issue 105090 - 5097 pp.
We present a multiscale model describing wet chemical etching of swift heavy ion tracks in olivine on the atomic scale. The approach combines the Monte Carlo code TREKIS and molecular dynamics for simulations of excitation and structure transformations of the material after an ion impact. Analysis of the obtained atomic positions in the proximity of the ion trajectory allows us to build up the algorithm of atom-by-atom removal from the etching surface. The model describes the primary etching of the highly damaged cylindrical track core followed by dissociation of the peripheral region and formation of etched channels, cross-section shapes of which depend on the crystal orientations relative to the incident ion beam.
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P. N. Lebedev Physical Institute of the Russian Academy of Sciences, Leninskij pr. 53, Moscow, 119991, Russian Federation
Joint Institute for Nuclear Research, Joliot-Curie 6, Dubna, Moscow, 141980, Russian Federation
The Institute of Nuclear Physics, Ibragimov St. 1, Almaty, 050032, Kazakhstan
National Research Centre Kurchatov Institute, Kurchatov Sq. 1, Moscow, 123182, Russian Federation
P. N. Lebedev Physical Institute of the Russian Academy of Sciences
Joint Institute for Nuclear Research
The Institute of Nuclear Physics
National Research Centre Kurchatov Institute
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