Paramagnetic Properties of Carbon Films
Baitimbetova B.A. Ryabikin Y.A. Rakymetov B.A. Murzalinov D.O. Kantarbaeva D.O. Duamet B. Dmitriyeva E.A. Serikkanov A.S. Yelemessov K.
September 2023Multidisciplinary Digital Publishing Institute (MDPI)
Coatings
2023#13Issue 9
This research paper presents the results of obtaining carbon films on various substrates (quartz, mica, and silicon) at temperatures from 0 °C (initial) to 800 °C through plasma chemical vapor deposition. The carbon films obtained on various films were studied using the method of electron paramagnetic resonance (EPR). EPR measurements were carried out on twenty samples at a perpendicular and parallel arrangement of the sample plane concerning the orientation of the magnetic field. When measuring the resonance conditions by changing the magnetic field, an EPR signal appeared in all of the deposited samples. The paper presents a general view of the EPR spectrum in all of the samples, including the signal intensity, g-factor, line widths, and normalized signal intensity of the carbon films on various substrates at temperatures from 0 °C to 800 °C. Studies show that with an increase in temperature, the normalized intensity of the EPR signal line increases during the deposition of a carbon in all deposited substrates (quartz, mica, and silicon) using the method of plasma decomposition of a mixture of methane and hydrogen.
carbon films , electron paramagnetic resonance , intensity of signal , magnetic field , paramagnetic property , various substrates
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Department of Materials Science, Nanotechnology and Engineering Physics, Satbayev University, Almaty, 050013, Kazakhstan
Institute of Physics and Technology, Satbayev University, Almaty, 050032, Kazakhstan
Department of Materials Science
Institute of Physics and Technology
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